Anadef 2026
Two engineers from Digit-concept—Alban Poquerusse and Elouan Le Ny—attended this 20th edition of Anadef.
Once again, this edition of Anadef was rich in discussions and presentations on the field of semiconductor failure analysis.
In particular, our two colleagues presented a case study involving etching using both the acid etching method (ISA 777) and the atmospheric plasma etching method (iMIP XL), highlighting the advantages and disadvantages of both methods. They discussed the complexity of determining the optimal time to stop an acid etch, as well as the challenges encountered when etching a component with significant depth. They compared this to atmospheric plasma etching, which, despite a longer process time, offers excellent selectivity for the layers to be removed.